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August 1 |
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X11 The Reflected Light Microscope (Metallograph) Understanding the Basics and Optimizing Results |
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The reflected light microscope is the most common tool used to observe opaque samples, mostly polished material specimens, at magnifications up to 2000x. The best results are achieved when the operator understands the function of each part of the microscope and knows how to select the most beneficial settings for the job at hand. In this workshop issues such as the selection of microscopes, (upright vs. inverted), illumination methods (bright field, dark field, polarized light, DIC), and type of objective (achromat, plan panchromatic, oil immersion) will be discussed. Correct adjustments such as the aperture diaphragm and the eyepieces increase image quality and decrease operator fatigue. A step-by-step process will illustrate how to set up a microscope properly. The workshop will provide in-struction on calibration of the magnification. After the lectures microscopes will be available to demonstrate and practice the principles discussed in the course. Participants are encouraged to bring prepared samples to the workshop. |
X12 Modern Practice in Metallurgical and Materials Failure Analysis |
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X13 Introductory Confocal Microscopy |
| Confocal microscopy has become a primary method in many laboratories for visualizing microscopic structure in the third and fourth dimensions. However, in many cases individual users are expected to operate complex confocal microscopes without being given the opportunity to learn basic principals. In addition, confocal technology is rapidly evolving and now often includes systems with new lasers, detectors and spectral imaging capabilities. This workshop will expand upon a number of topics covered in tutorials on this subject during the past two years that students, technologists, and researchers new to confocal often need to efficiently use confocal microscopy to obtain publication-quality images. The workshop will target beginning and intermediate users and will include an overview of some applications of confocal microscopy, followed by topics that include the basics of fluorescence and fluorescent probes, biological specimen preparation (fixation, staining, optical properties and mounting materials), the basic components of a confocal microscope (lasers, dichroic mirrors, microscope objectives, photomultiplier tubes, etc), and applications of digital imaging in confocal microscopy. Proper selection of user-adjustable parameters to optimize image collection will be addressed. Although the emphasis of the course will be on single photon laser scanning confocal systems, other types of confocal microscopes such as multiphoton and spinning disk systems will also be discussed. Ample time will also be provided for questions and audience discussion. |
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X14 Fluorescence Imaging of the Living Cell |
| Returning science to the living cell, tissue or organisms is the goal of post-genomic research. Microscopic imaging is one of the principal methodologies that may be applied to the living system. In fact, developments in detectors, computing, and fluorescent proteins have moved these approaches to the center of basic research in living systems. This day-long workshop concentrates on live-cell imaging using fluorescence methods. The lectures are focused on the optimization of the entire microscope system for live cell imaging, including automation, objectives and detectors. Lectures on fluorescent proteins and their use and comparative value will be presented as well as discussions of the merits of newer methods such as total internal reflection fluorescence (TIRF) and multiphoton imaging. Following the lectures there will be demonstrations using cutting-edge integrated systems from the major manufacturers, such that students can get a hands-on expe-rience of power live cell imaging. |
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X15 Digital Imaging 2004 |
| This course will discuss the various strategies needed for producing digital data that is suitable for publication. Because this field is evolving so rapidly, the course material will change sufficiently that individuals may find it beneficial to repeat this course. We will discuss how to acquire the best digital image for a given sample. Noise removal and resolution issues will be discussed in detail. We will examine the current best technologies for archiving the image data as well as the image formats and standards we should adopt. We will examine in detail image printing. We will emphasize several issues that must be understood in order to produce high quality images every time on any printer the most critical being the gamma correction! There will be a strong emphasis placed on the most affordable solutions available regardless of platform or operating system. We will examine the latest technologies such as digital cameras and digital video to see how they may best be applied to microscopy. We will discuss the major issues that must be addressed when moving to a more digital approach. |
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X16 Image Processing and Analysis |
| This will be an intensive step-by-step illustration of the various steps involved in enhancing images for presentation and extracting numeric data from them for analysis. The emphasis will be on comparison between various approaches applied to representative images, rather than the theoretical underpinnings for the various techniques. Morning: A survey of the principal techniques for image processing will cover spatial domain operations such as histogram modification, convolution with filters, neighborhood ranking operations, etc., showing their use for removal of random noise, correction of nonuniform brightness, enhancement of edges and local detail, etc. Fourier domain processing will be used to remove periodic noise, deconvolve image blur, locate features by cross correlation, and isolate periodic structures. Afternoon: Thresholding of images, and processing of the binary images using morphological operations such as erosion and dilation, skeletonization, watershed segmentation, etc., will be used to delineate features of interest for measurement. The Boolean combination of images and the use of appropriate grids allow straightforward stereological measurements of 3D structure to be performed. Feature specific measurements provide data on object density (or color), position, size and shape. |
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X17 Best Practices of Imaging and Microanalysis in Variable Pressure SEM and Environmental SEM |
| Leading and highly experienced researchers will address VPSEM and ESEM in four stages through the day. The course will open with a review of the available variable pressure and environmental SEM instrumentation with specific attention to the variety of gaseous or variable pressure secondary electron (VPSE) detectors. Benefits of different electron sources will also be considered, together with a discussion of samples suitable for routine image quality control. The second course component will focus on electron-gas interactions and their roles in image production. The influence of the different operating conditions will be considered in detail. The benefits, and otherwise, of the range of potential imaging gases will be compared. The afternoon sessions will target x-ray microanalysis, dynamic experimentation and extended pressure operation. Particular attention will be paid to the stabilization and imaging of fully hydrated samples. All topics will be supported with images and each segment but open discussion will be encouraged during the day. |
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X18 Application Pathways- Native sample to Immunolabeling via
Tokayasu and High Pressure Freezing |
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High pressure freezing is the way to localize or characterize organelles, subcellular components and gene products in electron microscopy. This single-day short course will discuss the process of sample preparation using cryo techniques. The course will review methods for cryopreparation of biological samples. High pressure freezing, why,? the advantages of HPF over chemical and or microwave fixation. After HPF what techniques or methods of tissue examination can be used, such as cryo planing, cryosectioning, freeze substitution, freeze fracture and immunolabeling. |
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X19 Microspectroscopy - Raman, FT-IR and EDXRF Microscopy |
| Today more and more laboratories are combining microscopy with the power of spectroscopy to provide a detailed characterization of their samples. This short course will show how laboratories are using Raman, FT-IR and EDXRF Microspectroscopy to their benefit. These three techniques provide molecular and/or elemental information with a spatial resolution at the micron level. They can also be used for hyperspectral imaging to show how the molecular and elemental structure changes throughout a sample. Attendees will leave the course with a knowledge of the varied uses of the instrumentation and the applicability of these methods to their particular materials. Examples from biological, pharmaceutical, polymer, semiconductor and forensic applications will be used to illustrate the power of these techniques. The course will offer lectures, hands on instrumentation and a chance for questions. Participants are welcome to bring samples. |
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X20 Focused Ion Beam: FAQs, Principles, and Applications |
| Focused Ion beam (FIB) systems have been in existence for a little over two decades, but only within the past decade or so have they really made significant contributions in industry. In the early years, FIB systems were primarily used for mask repair. Now, they have become a boon to the semiconductor industry, the principle user and a driving force for FIB development. FIB systems now have numerous and important applications such as carrying out device edits on prototype devices to fix design errors, incorporating last minute changes requested by clients, run experiments, probe circuits for failure analysis (FA), etc. FIB systems can turn around devices in a matter of hours prior to mask changes, and are well suited for performing system and board level checks. Devices can now be worked iteratively until the correct result is achieved. On the analytical side, site-specific sample preparation for scanning and transmission electron microscopes (SEM/TEM) has never been so (relatively) easy and repeatable. This intensive, beginner-to-intermediate level course targets failure analysts with a desire to understand the use of FIBs in industry. In this course, you will gain an understanding of focused ion beam systems and how they are used in industry. We will discuss prototype chip repair using FIB systems to correct design errors, and site-specific sample preparation for SEM/TEM. In addition you will learn practical tips and techniques for real-world applications. |